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This Test Method covers determination of the effective work function of both oxide and high-κ gate stacks
SEMI S2 — Environmental
3 Based on the result of investigation for human eye’s sensitivity to Mura in ergonomics approach
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P00900 - SEMI P9 - Guide for Functional Testing of Microelectronic Resists Revision:SEMI P9-89 - Superseded This Test Method covers determinationThe purpose of this Guide is to provide a baseline program of test procedures needed to functionally test liquid developed resists, resist developers, and rinses for microelectronic applications. It can also be used as a guide to evaluate process modifications to such systems. This Guide is intended to be applicable for photo, DUV, X ray, and electron beam processes. Virtually all lithographic fabrication processes vary in some way from location to
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