PV04100 - SEMI PV41 - Test Method for In-Line, Noncontact Measurement of Thickness and Thickness Variation of Silicon Wafers for PV Applications Using Capacitive Probes StdPbc-0724 SEMI G93-0412 (first published)

SEMI G93-0412 (first published)

The purpose of this Document is to provide a guide for hafnium chloride for which a need has been identified

This Document defines a method of testing the wetted surfaces of stainless steel tubing

SEMI F57-0622 (technical revision)

It also must not decrease the efficiency of the solar cells nor impact the cell/module manufacturing cost negatively

PV04100 - SEMI PV41 - Test Method for In-Line, Noncontact Measurement of Thickness and Thickness Variation of Silicon Wafers for PV Applications Using Capacitive Probes StdPbc-0724 SEMI G93-0412 (first published)Wafer thickness and its variation across a wafer are important parameters for solar cell manufacturing. Excessive thickness variations within a lot from wafer to wafer or within a wafer may negatively impact process yield and solar cell efficiency. Both parameters are part of the specification for solar cell wafers (SEMI PV22), which define a thickness range as well as an upper limit for the total thickness variation (TTV). In addition, careful